Detailed Description

Sputtering is a new type of Physical Vapor Deposition (PVD) method.

The sputtering is mainly used in: flat panel displays, coated glass industry (including architectural glass, automotive glass, optical glass and other films), thin-film solar, surface engineering (decorative & Tools), (magnetic, optical) recording medium Microelectronics car lights, decorative coating..

In the field of Rotatable Target, Robust first proposed the monolithic tube target in the year 2009, which has been recognized by domestic and foreign customers. We can provide the following sizes according to the requirements of customers:

Planar target: single weight:≤260kg, purity:≥99.97% Rotatable target: OD:Φ140-180mm;ID:Φ125-Φ135mm. length≤3300mm ,purity:≥99.97%